References
- Chou, S. Y., Krauss, P. R., and Renstrom, P. J., 1995, "Imprint of Sub-25nm Vias and Trenches in Polymers," Applied Physics Letters, Vol. 67, pp. 3114-3116. https://doi.org/10.1063/1.114851
- Kang, J. H., Kim, S. M., Woo, Y. S., and Lee, W. I., 2008, "Analysis of Resin Flow During Nanoimprinting Lithographic Process," Current Applied Physics, Vol. 8, pp. 679-686. https://doi.org/10.1016/j.cap.2007.04.058
- Jeong, J. H., Choi, Y. S., Shin, Y. J., Lee, J. J,. and Park, K. T., 2002, "Flow Behavior at the Embossing Stage of Nanoimprint Lithography," Fibers and Polymers, Vol. 3, pp. 113-119. https://doi.org/10.1007/BF02892627
- Hirai, Y., Konish, T., Yoshikawa, T,. and Yoshida, S., 2004, "Simulation and Experimental Study of Polymer Deformation in Nanoimprint Lithography," Journal of Vaccum Science and Technology B, Vol. 22, pp. 3288-3293. https://doi.org/10.1116/1.1826058
- Rowland, H. D. and King, W. P., 2004, "Polymer Deformation and Filling Modes During Microembossing," Journal of Micromechanics and Microengineering, Vol. 14, pp. 1625-1632. https://doi.org/10.1088/0960-1317/14/12/005
- Kim, N. W., Kim, K. W., and Sin, H.-C., 2008, "Finite Element Analysis of Low Temperature Thermal Nanoimprint Lithography Using a Viscoelastic Model," Microelectronic Engineering, Vol. 85, pp. 1858-1865. https://doi.org/10.1016/j.mee.2008.05.030
- Choi, C. H. and Kim, C. J., 2006, "Large Slip of Aqueous Liquid Flow over a Nanoengineered Superhydrophobic Surface," Physical Review Letters, Vol. 96, pp. 066001. https://doi.org/10.1103/PhysRevLett.96.066001
- Yao, D. and Kim, B., 2002, "Simulation of the Filling Process in Micro Channels for Polymeric Materials," Journal of Micromechanics and Microengineering, Vol. 12, pp. 604-610. https://doi.org/10.1088/0960-1317/12/5/314
- Jones, R. L., Hu, T., Soles, C. L., Lin, E. K., Reano, R.M., Pang, S. W., and Casa, D. M., 2006, "Real-time Shape Evolution of Nanoimprinted Polymer Structures during Thermal Annealing," Nano Letters, Vol. 6, pp. 1723-1728. https://doi.org/10.1021/nl061086i
- Yu, Z., Gao, H., and Chou, S. Y., 2007, "RIMS (real-time imprint monitoring by scattering of light) Study of Pressure, Temperature and Resist Effects on Nanoimprint Lithography," Nanotechnology, Vol. 18, pp. 065304. https://doi.org/10.1088/0957-4484/18/6/065304
- Schift, H. and Heydermann, L. J. in: C.M. Sotomayor Torres (Ed), 1970, Alternative Lithography, Kluwer Academic/Plenum Publishers, New York.
- Kim, K. W. and Kim, N. W., 2008, "Analytical Approach of Polymer Flow in Thermal Nanoimprint Lithography," Transactions of the Korean Society of Machine Tool Engineers, Vol. 17, No. 3, pp. 20-26.
- Young, W. B., 2005, "Analysis of the Nanoimprint Lithography with a Viscous Model," Microelectronic Engineering, Vol. 77, pp. 405-411. https://doi.org/10.1016/j.mee.2005.01.024
- Ferry, J. D., 1970, Viscoelastic Properties of Polymers, 2nd ed., John Willey & Sons, Inc. New York
- Hatzikiriakos, S. G. and Dealy, J. M., 1991, "Wall Slip of Molten High Density Polyethylene. I. Sliding Plate Rheometer Studies," Journal of Rheology, Vol. 35, pp. 497-523. https://doi.org/10.1122/1.550178