Journal of the Korean Vacuum Society (한국진공학회지)

The Korean Vacuum Society (한국진공학회)
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The Effect of Ar/O2 Partial Pressure Ratio on the Ferroelectric Properties of (Pb0.92La0.08)(Zr0.65Ti0.35)O3 Thin Films Deposited by RF Magnetron Sputtering Method

RF Magnetron Sputtering법으로 제작된 (Pb0.92La0.08)(Zr0.65Ti0.35)O3 박막의 Ar/O2 분압비에 따른 강유전 특성연구

  • Kim, Sang-Jih (School of Materials Science & Engineering, Pusan National University) ;
  • Yoon, Ji-Eon (School of Materials Science & Engineering, Pusan National University) ;
  • Hwang, Dong-Hyun (School of Materials Science & Engineering, Pusan National University) ;
  • Lee, In-Seok (School of Materials Science & Engineering, Pusan National University) ;
  • Ahn, Jung-Hoon (School of Materials Science & Engineering, Pusan National University) ;
  • Son, Young-Guk (School of Materials Science & Engineering, Pusan National University)
  • Published : 2009.03.31
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Abstract

PLZT ferroelectric thin films were deposited on Pt/Ti/$SiO_2$/Si substrate with $TiO_2$ buffer layer in between by rf magnetron sputtering method. In order to investigate the effect of Ar/$O_2$ partial pressure ratio on the ferroelectric properties of PLZT thin films, PLZT thin films were deposited at various Ar/$O_2$ partial pressure ratio ; 27/1.5 seem, 23/5.5 seem, 21/7.5 seem and 19/9.5 seem. The crystallinities of PLZT thin films were analyzed by XRD. The surface morphology was observed using FE-SEM. The P-E hysteresis loops, the remanent polarization characteristics and the leakage current characteristics were obtained using a Precision LC. The crystallinity and elaborateness of PLZT thin films were decreased as increasing the oxygen partial pressure ratio. And preferred orientation of PLZT thin films changed from (110) plane to (111) plane. The oxygen partial pressure ratio affects the thin film surface morphology and the ferroelectric properties.

rf magnetron sputtering 법을 이용하여 Pt/Ti/$SiO_2$/Si 기판 위에 buffer layer인 $TiO_2$ 층을 증착한 후 PLZT 강유전체 박막을 증착하였다. PLZT 박막 증착 시 가스 분압비가 박막의 특성에 미치는 영향을 알아보기 위해 Ar/$O_2$ 분압비를 각각 27/1.5 sccm, 23/5.5 sccm, 21/7.5 sccm, 19/9.5 sccm로 변화시키면서 박막을 증착하였다. 이들 박막의 구조적인 특성을 분석하기 위해 X-선 회절법을 사용하였으며 FE-SEM을 이용하여 입자상을 관찰하였다. 또한 박막의 유전특성을 분석하기 위해 Precision LC를 이용하여 이력곡선, 잔류분극, 누설전류를 측정하였다. 산소 분압이 높아질수록 박막의 결정성 및 치밀성이 저하되었으며, (110) 방향에서 (111) 방향으로 우선배향성이 변화하는 것을 확인하였다. 산소 분압비의 변화는 박막 표면 및 강유전 특성에 영향을 미치는 것으로 판단된다.

Keywords

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