Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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The Oxygen Barrier Properties of 3-aminopropyltrimethoxysilane (APTMOS) Coatings on PET Film

3-aminopropyltrimethoxysilane(APTMOS)을 코팅한 PET 필름의 산소차단성 연구

  • Lee, Sung-Koo (Green Engineering Team, Korea Institute of Industrial Technology) ;
  • Kim, Hyun-Joon (Department of Chemical Engineering, Kyonggi University)
  • 이성구 (한국생산기술연구원 청정생산기술연구부) ;
  • 김현준 (경기대학교 화학공학과)
  • Published : 2009.06.30
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Abstract

The oxygen barrier films were formed on poly(ethylene terephthalate) (PET) substrate by a sol-gel process using 3-aminoproprytrimethoxysilane (APTMOS). The effects of solvent type, coating times and incorporation of fumed silica on oxygen permeability coefficient were investigated. The APTMOS coating film prepared from methanol as a solvent exhibited higher oxygen barrier properties than that using THF. The oxygen permeability coefficient of coated film with APTMOS/methanol by coating 7 times was measured to be $2.28{\times}10^{-6}$, while that of PET film was $1.16{\times}10^{-4}$ GPU. The addition of fumed silica does not affect the oxygen barrier properties. It may be explained that silica particles disrupt chain packing, which leads to an increase in free volume for permeation.

Keywords

References

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