한국표면공학회지 (Journal of the Korean institute of surface engineering)

  • 제41권5호
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  • Pages.205-213
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  • 2008
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  • 1225-8024(pISSN)
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  • 2288-8403(eISSN)
한국표면공학회 (The Korean Institute of Surface Engineering)
권호 표지
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3차원 입자 모델을 이용한 마그네트론 스퍼터링 음극의 특성 분석

Characterization of a Magnetron Sputtering Cathode by a 3D Particle Model

  • 주정훈 (군산대학교 공과대학 신소재공학과, 플라즈마 소재 응용 센터)
  • Joo, Jung-Hoon (Department of Materials Science and Engineering and Plasma Materials Research Center, Kunsan National University)
  • 발행 : 2008.10.31
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초록

A 3D particle code is developed to analyze electron behavior in a planar magnetron sputtering cathode either in balanced or unbalanced configuration. Three types of collisions are included; electron - neutral elastic, excitation to a metastable state and ionization. Flight path is calculated by a 4-th order Runge-Kutta method with a time step of 10 ps. Effects of electron starting position, magnetic field intensity and configuration were analyzed. For a more efficient and accurate modeling, multithreading technique is considered for multicore CPU computers. Under an assumption of cold ion approach, target erosion profiles are predicted for a flat target surface.

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참고문헌

  1. Q. Fan, L. Zhou and J. Gracio, J. Phys. D: Appl. Phys. 36 (2003) 244 https://doi.org/10.1088/0022-3727/36/3/305
  2. T. E. Sheridan, M. J. Goekner, and J. Goree, J. Vac. Sci. Technol A8 (1990) 30
  3. A. Wendt, M. A. Lieberman, and H. Meuth, J. Vac. Sci .Technol A6 (1988) 1827
  4. S. Kondo and K. Nanbu, J. Phys. D: Appl. Phys. 32 (1999) 1142 https://doi.org/10.1088/0022-3727/32/10/311
  5. J. Phillips, Seminar materials, "High performance computing with CUDA: Molecular Dynamics", University of Illinois at Urbana-Champagne, 2007
  6. S. Brown, "Basic data of plasma physics", American Vacuum Society AIP press, New York (1994) 230
  7. S. N. Nahar and J. M. Wadehra, Phy. Rev A 35 (1987) 2051 https://doi.org/10.1103/PhysRevA.35.2051
  8. M. H. Kalos, P. A. Whitlock, "Monte Carlo Methods Volume I: Basics", John Wiley & Sons, New York (1986) 61
  9. J. O'Brien, P.J. Kelly, Surf. Coat. Technol. 142-144 (2001) 621 https://doi.org/10.1016/S0257-8972(01)01058-1
  10. J. W. Bradley, H. Backer, P. J. Kelly, R. D. Arnell, Surf. Coat. Technol 135 (2001) 221 https://doi.org/10.1016/S0257-8972(00)00990-7

피인용 문헌

  1. Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array vol.23, pp.4, 2014, https://doi.org/10.5757/ASCT.2014.23.4.161