Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Characterization of a Magnetron Sputtering Cathode by a 3D Particle Model

3차원 입자 모델을 이용한 마그네트론 스퍼터링 음극의 특성 분석

  • Joo, Jung-Hoon (Department of Materials Science and Engineering and Plasma Materials Research Center, Kunsan National University)
  • 주정훈 (군산대학교 공과대학 신소재공학과, 플라즈마 소재 응용 센터)
  • Published : 2008.10.31
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Abstract

A 3D particle code is developed to analyze electron behavior in a planar magnetron sputtering cathode either in balanced or unbalanced configuration. Three types of collisions are included; electron - neutral elastic, excitation to a metastable state and ionization. Flight path is calculated by a 4-th order Runge-Kutta method with a time step of 10 ps. Effects of electron starting position, magnetic field intensity and configuration were analyzed. For a more efficient and accurate modeling, multithreading technique is considered for multicore CPU computers. Under an assumption of cold ion approach, target erosion profiles are predicted for a flat target surface.

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References

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Cited by

  1. Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array vol.23, pp.4, 2014, https://doi.org/10.5757/ASCT.2014.23.4.161