References
- 1. K. D. Hirschman, L. Tsybeskov, S. P. Duttagupta and P. M. Fauchet, Nature, 384, 338 (1996) https://doi.org/10.1038/384338a0
- A. Hohl, T. Wieder, P. A. van Aken, T. E. Weirich, G. Denniger, M. Vidal, S. Oswald, C. Deneke, J. Mayer and H. Fusses, J. Non-cryst. Solids, 320, 255 (2003) https://doi.org/10.1016/S0022-3093(03)00031-0
- Z.-X. Ma, X.-B. Liao and J. He, J. Appl. Phys., 83, 7934 (1998) https://doi.org/10.1063/1.367973
- X. Y. Chen, Y. F. Lu, L. J. Tang, Y. H. Wu, B. J. Cho, X. J. Xu, J. R. Dong and W. D. Song, J. Appl. Phys., 97, 014913 (2005) https://doi.org/10.1063/1.1829789
- V. Belot, R. J. P. Corriu, D. Leclercq, P. Lefevre, P. H. Mutin, A. Vioux and A. M. Flank, J. Non-cryst. Solids, 127, 207 (1991) https://doi.org/10.1016/0022-3093(91)90144-U
- T. Makimura, Y. Kunii, N. Ono and K. Murakami, Jpn. J. Appl. Phys., Part II, 35, L1703 (1996) https://doi.org/10.1143/JJAP.35.L1703
- S. Hasegawa, L. He, T. Inokuma and Y. Kurata, Phys. Rev. B, 46, 12478 (1992) https://doi.org/10.1103/PhysRevB.46.12478
- H. S. Bae, T. G. Kim, C. N. Whang, S. Im, J. S. Yun and J. H. Song, J. Appl. Phys., 91, 4078 (2002) https://doi.org/10.1063/1.1452768
- N. Tomozeiu, E. E. van Faassen, A. Palmero, W. M. Arnoldbik, A. M. Vredenberg and F. H. P. M. Habraken, Thin Solid Films, 447, 306 (2004) https://doi.org/10.1016/S0040-6090(03)01069-1
- R. S. Brusa, G. P. Karwasz, G. Mariotto, A. Zecca, R. Ferragut, P. Folegati, A. Dupasqueier, G. Ottaviani and R. Tonini, J. Appl. Phys., 94, 7483 (2003) https://doi.org/10.1063/1.1627956
- G. R. Lin, C. J. Lin and K. C. Yu, J. Appl. Phys., 96, 3025 (2004) https://doi.org/10.1063/1.1775041
- F. J. Himpsel, F. R. McFeely, A. Taleb-Ibrahimi, J. A. Yarmoff and G. Hollinger, Phys. Rev. B, 38, 6084 (1988) https://doi.org/10.1103/PhysRevB.38.6084
- A. Pasquarello, M. S. Hybertsen and R. Car, Phys. Rev. Lett., 74, 1024 (1995) https://doi.org/10.1103/PhysRevLett.74.1024
- C. Yi, H. U. Kim, S. W. Rhee, S. H. Oh and C.-G. Park, J. Vac. Sci. Technol. B, 19, 2067 (2001) https://doi.org/10.1116/1.1412657
- A. B. Christie, In: J. M. Walls (Ed.), X-ray photoelectron spectroscopy in methods of surface analysis, Cambridge University Press, New York, 1987, p. 157.
- J. F. Watts and J. Wolstenholme, An introduction to surface analysis by XPS and AES, John Wiley & Sons Ltd., Chichester, 2003, p. 76
- E. D. van Hattum, A. Palmero, W. M. Arnoldbik, H. Rudolph and F. H. P. M. Habraken, J. Appl. Phys., 102, 124505 (2007) https://doi.org/10.1063/1.2828163
- K.-N. Tu, J. W. Mayer, L. C. Feldman, Electronic Thin Film Science, 1st ed., p. 100-193, Macmillan Publishing Company, New York (1992)
- A. K. Kulkarni and L. C. Chang, Thin Solid Films, 301, 17 (1997) https://doi.org/10.1016/S0040-6090(96)09553-3
- N. I. Cho and D. I. Park, Thin Solid Films, 308/309, 465 (1997) https://doi.org/10.1016/S0040-6090(97)00441-0
- W. T. Tseng, Y. L. Wang and J. Niu, Thin Solid Films, 370, 96 (2000) https://doi.org/10.1016/S0040-6090(00)00941-X
- W. Tang, K. Xu, P. Wang and X. Li, Microelectronic Engineering, 66, 445 (2003) https://doi.org/10.1016/S0167-9317(02)00909-7
- H. Rinnert, M. Vergnat, G. Marchal and A. Burneau, J. Lumin., 80, 445 (1999) https://doi.org/10.1016/S0022-2313(98)00145-8
- H. Miyazaki and T. Goto, J. Non-Cryst. Solids, 352, 329 (2006) https://doi.org/10.1016/j.jnoncrysol.2005.12.008
- H. Rinnert, M. Vergnat and G. Marchal, Mater. Sci. Eng. B, 69/70, 484 (2000) https://doi.org/10.1016/S0921-5107(99)00276-7
- G. Baur, V. Wittwer and D. W. Berreman, Phys. Lett. A, 56, 142 (1976) https://doi.org/10.1016/0375-9601(76)90175-4
- T. J. Scheffer and J. Nehring, J. Appl. Phys., 48, 1783 (1977) https://doi.org/10.1063/1.323928
- D. L. Smith, Thin-film deposition principles and practices, 1st ed., p 23-25, McGraw Hill, San Francisco (1995)