한국전기전자재료학회논문지 (Journal of the Korean Institute of Electrical and Electronic Material Engineers)

  • 제21권5호
  • /
  • Pages.468-473
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  • 2008
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  • 1226-7945(pISSN)
  • /
  • 2288-3258(eISSN)
한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
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Electron-beam Evaporation의 증착 방법에 따른 MgO Layer의 표면 특성에 관한 연구

A Study on the Surface Characteristics of MgO Layer as the Various Deposition Methods of Electron-beam Evaporation

  • 허정은 (부산대학교 전자전기통신공학부) ;
  • 이돈규 (동의대학교 교양교육원) ;
  • 조성용 (부산대학교 전자전기통신공학부) ;
  • 이해준 (부산대학교 전자전기통신공학부) ;
  • 이호준 (부산대학교 전자전기통신공학부) ;
  • 박정후 (부산대학교 전자전기통신공학부)
  • 발행 : 2008.05.01
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초록

A MgO layer is used as electrode protective film in the alternating current plasma display panel (AC PDP). The properties of MgO layer are thought to be one of the most important factors that affects the panel reliability through the firing voltage variation. In this study, we investigated the relations between the surface characteristics and e-beam evaporation process parameters such as deposition rate, temperature of substrate and distance between the MgO pellet and substrate. To produce the MgO layer of (200) crystal orientation, we suggest the high temperature of the substrate, the long distance between the pellet and substrate and the high deposition rate.

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참고문헌

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