A Study on Ashing Effects of Atmospheric Plasma for the Cleaning of Flat Panel Display

평판 디스플레이 세정을 위한 상압 플라즈마 에싱효과에 관한 연구

  • Huh, Yong-Jeong (School of Mechatronics Engineering, Korea University of Technology and Education) ;
  • Lee, Gun-Young (School of Mechatronics Engineering, Korea University of Technology and Education)
  • 허용정 (한국기술교육대학교 메카트로닉스공학부) ;
  • 이건영 (한국기술교육대학교 메카트로닉스공학부)
  • Published : 2008.06.30

Abstract

This study shows the improvement of PR-Ashing rates in semi-conductor process using Atmospheric Plasma. Taguchi method is used to improve Ashing rates of photo-resist that is spread on the surface of a wafer. Improvement of Ashing rates is acquired through the decision of the effective factors and suitable combination of the factors. The results show the contribution rate of each factor and the effectiveness of Plasma for PR-Ashing process in this system.

Keywords