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Development of Fabrication Process of Light Guiding Plate with Nanometer-Sized-Cylindrical Pattern Using Nano Imprint Lithography Method

나노 임프린트 리소그래피법에 의한 나노미터급 원기둥 패턴을 갖는 도광판의 제작 공정 개발

  • 이병욱 (순천향대학교 전자정보공학과) ;
  • 홍진수 (순천향대학교 전자물리학과) ;
  • 김창교 (순천향대학교 전자정보공학과)
  • Published : 2008.04.01

Abstract

PMMA light guiding plate with nano pattern was fabricated by nano imprint lithography method. A silicon mold for electroplating of nickel was fabricated by conventional photolithography process. A nickel stamp for nano imprint lithography was fabricated by electroplating process using silicon mold. The nano imprint lithography was performed on PMMA plate at $140^{\circ}C$ under pressure of 20kN. The nano pattern on PMMA plate was investigated using FE-SEM. It is shown that the patterns were well transferred for several steps and the nano imprint lithography method could be applied for fabricating patterns of light guiding plate.

Keywords

References

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