Preparation of Thin YSZ Film by Electrostatic Spray Deposition

정전분무법을 이용한 YSZ 박막 제조

  • Kwon, Byeongwan (College of Environment & Applied Chemistry, Kyunghee University) ;
  • Kim, Jinsoo (College of Environment & Applied Chemistry, Kyunghee University) ;
  • Park, Jung Hoon (Fossil Energy & Environment Research Department, Korea Institute of Energy Research)
  • 권병완 (경희대학교 환경.응용화학대학) ;
  • 김진수 (경희대학교 환경.응용화학대학) ;
  • 박정훈 (한국에너지기술연구원 화석에너지 환경연구부)
  • Received : 2007.12.12
  • Accepted : 2007.12.28
  • Published : 2008.02.10

Abstract

In this study, thin YSZ film was prepared by electrostatic spray deposition. The morphology of thin film was strongly influenced by precursor solution and substrate temperature. Especially, dense YSZ film was obtained at the substrate temperature of $400^{\circ}C$. The YSZ film growth rate was $12{\mu}m/h $ at the optimum conditions. Product film was characterized by XRD, FE-SEM and EDX.

본 연구에서는 정전분무법을 이용하여 YSZ 박막을 제조하였다. 제조된 박막은 제조시 전구체 용액, 지지체 온도 등에 크게 영향을 받았으며, 특히 지지체 온도가 $400^{\circ}C$일 때 치밀한 YSZ 박막을 형성할 수 있었다. 최적조건 하에서 정전분무법을 활용하면 약 $12{\mu}m/h $의 속도로 치밀한 YSZ 박막을 형성할 수 있었다. 제조된 박막은 XRD, FE-SEM, EDX 등을 이용하여 분석하였다.

Keywords

Acknowledgement

Supported by : 과학기술부

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