Applied Chemistry for Engineering (공업화학)

The Korean Society of Industrial and Engineering Chemistry (한국공업화학회)
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Deposition of Amorphous Carbon Layer by PECVD

PECVD에 의한 비정질 탄소층 증착

  • Jung, Ilhyun (Department of Chemical Engineering, University of Dankook)
  • Received : 2008.03.25
  • Accepted : 2008.05.01
  • Published : 2008.06.10
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Abstract

3,3-Dimethyl-1-butene ($C_6H_{12}$) monomer was deposited using a plasma-enhanced chemical vapor deposition (PECVD) instrument. The more the R.F. power/pressure ratio in FT-IR spectrum, the less the hydrogen quantity and the dangling bond in amorphous carbon films observed so that the mechanical property of the films are improved related to the density. Also, with the increase D peak in Raman spectrum is increased and the ring structure's films are produced. According to these results, hardness and modulus are 12 GPa and 85 GPa, respectively. The refractive index (n) and extinction coefficients (k) of the deposited films are increased with the increase in a power/pressure ratio.

3,3-Dimethyl-1-butene ($C_6H_{12}$) 모노머를 PECVD 증착하였다. 비정질 탄소막은 FT-IR 스펙트럼에서 R.F.전력/압력비가 증가할수록 수소의 함유량과 dangling bond가 감소되고 막의 기계적 특성은 밀도가 상승함으로써 비례하여 향상되었다. 또한 Raman 스펙트럼에서 D 피크가 증가하였고 고리구조의 막을 형성하였다. 따라서 경도와 모듈러스가 각각 12 GPa과 85 GPa였다. 증착된 막의 굴절률(n)과 흡광계수(k)는 전력/압력비가 상승할수록 증가하였다.

Keywords

Acknowledgement

Supported by : 단국대학교

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