Journal of the Korean Society for Precision Engineering (한국정밀공학회지)

Korean Society for Precision Engineering (한국정밀공학회)
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Development of Large-area Two-photon Stereolithography Process for the Fabrication of Large Three-dimensional Microstructures

대면적 3 차원 마이크로 형상제작을 위한 스테이지 스캐닝 시스템을 이용한 이광자 흡수 광조형 공정 개발

  • 임태우 (한국과학기술원 기계공학과) ;
  • 손용 (한국과학기술원 기계공학과) ;
  • 이신욱 (한국과학기술원 물리학과) ;
  • 공홍진 (한국과학기술원 물리학과) ;
  • 박상후 (부산대학교 기계공학부) ;
  • 양동열 (한국과학기술원 기계공학과)
  • Published : 2008.01.01
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Abstract

Two-photon stereolithography is recognized as a promising process for the fabrication of three-dimensional (3D) microstructures with 100 nm resolution. Generally, beam-scanning system has been used in the conventional process of two-photon stereolithography, which is limited to the fabrication of micro-prototypes in small area of several tens micrometers. For the applications to 3D high-functional micro-devices, the fabrication area of the process is required to be enlarged. In this paper, large-area two-photon stereolithography (L-TPS) employing stage scanning system has been developed. Continuous scanning method is suggested to improve the fabrication speed and parameter study is conducted. An objective lens of high numerical aperture (N.A.) and high strength material were employed in this system. Through this work, 3D microstructures of $600*600*100\;{\mu}m$ were fabricated.

Keywords

References

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