한국표면공학회지 (Journal of the Korean institute of surface engineering)

  • 제41권6호
  • /
  • Pages.331-334
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  • 2008
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  • 1225-8024(pISSN)
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  • 2288-8403(eISSN)
한국표면공학회 (The Korean Institute of Surface Engineering)
권호 표지
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나노임프린트 리소그래피를 이용한 곡면 기판 위에 정렬된 나노 볼 패턴 형성에 관한 연구

Fabrication of High Ordered Nano-sphere Array on Curved Substrate by Nanoimprint Lithography

  • 홍성훈 (고려대학교 신소재공학과) ;
  • 배병주 (고려대학교 신소재공학과) ;
  • 곽신웅 (코닉시스템(주)) ;
  • 이헌 (고려대학교 신소재공학과)
  • Hong, S.H. (Department of Materials Science and Engineering, Korea University) ;
  • Bae, B.J. (Department of Materials Science and Engineering, Korea University) ;
  • Kwak, S.U. (RND center, Kornic System Co.) ;
  • Lee, H. (Department of Materials Science and Engineering, Korea University)
  • 발행 : 2008.12.31
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초록

The replica of highly ordered nano-sphere array patterns were fabricated using hot embossing method. First, silica nano-sphere array on Si substrate was transferred to PVC film at $130^{\circ}C$ and 7 bar using hot embossing process. Then, silica nano-sphere array on PVC template was removed by soaking the PVC film in buffered oxide etcher. In order to form anti-stiction layer, the PVC template was coated with silicon dioxide layer and self-assembled monolayer. Through UV nanoimprint lithography with the fabricated flexible PVC template, highly ordered nano-sphere array pattern was imprinted on curved substrates with high fidelity.

키워드

참고문헌

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