한국표면공학회지 (Journal of the Korean institute of surface engineering)

  • 제41권6호
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  • Pages.274-278
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  • 2008
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  • 1225-8024(pISSN)
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  • 2288-8403(eISSN)
한국표면공학회 (The Korean Institute of Surface Engineering)
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펄스 마그네트론 스퍼터링 음극의 열전달 해석

Heat Transfer Analysis of a Pulse Magnetron Sputtering Cathode

  • 주정훈 (군산대학교 공과대학 신소재공학과, 플라즈마 소재 응용 센터)
  • Joo, Jung-Hoon (Department of Materials Science and Engineering and Plasma Materials Research Center, Kunsan National University)
  • 발행 : 2008.12.31
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초록

3-dimensional numerical analysis for a rectangular magnetron cathode model is done to predict cooling characteristics of high power sputtering system for ZnO deposition. It includes cooling channel design, heat transfer analysis of a target, bonding layer and backing plate. In order to model erosion profiles of a target, ion current density distribution from 3D Monte Carlo simulation is used to distribute total sputtering power to 5 discrete regions. At 3 kW of sputtering power and cooling water flow of 1 liter/min at $10^{\circ}C$, the maximum surface temperature was $45.8^{\circ}C$ for a flat new target and $156^{\circ}C$ for a target eroded by 1/3 of its thickness, respectively.

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참고문헌

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