한국레이저가공학회지 (Laser Solutions)
- 제10권2호
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- Pages.17-24
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- 2007
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- 1229-0963(pISSN)
355nm UV 레이저를 이용한 AZ5214와 SU-8 포토레지스트 어블레이션에 관한 연구
A Study on the Ablation of AZ5214 and SU-8 Photoresist Processed by 355nm UV Laser
초록
We have studied a laser direct writing lithography(LDWL). This is more important to apply to micro patterning using UV laser. We demonstrate the possibility of LDWL and construct the fabrication system. We use Galvano scanner to process quickly micro patterns from computer data. And laser beam is focused with