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투명 폴리카보네이트 보호코팅을 위한 산화알루미늄 박막

Al2O3 Coating on Transparent Polycarbonate Substrates for the Hard-coating Application

  • 김훈 (서울대학교 재료공학부) ;
  • 남경희 (서울대학교 재료공학부) ;
  • 장동수 (서울대학교 재료공학부) ;
  • 이정중 (서울대학교 재료공학부)
  • Kim, Hun (Plasma Surface Engineering Laboratory, School of Materials Science and Engineering, Seoul National University) ;
  • Nam, Kyoung-Hee (Plasma Surface Engineering Laboratory, School of Materials Science and Engineering, Seoul National University) ;
  • Jang, Dong-Su (Plasma Surface Engineering Laboratory, School of Materials Science and Engineering, Seoul National University) ;
  • Lee, Jung-Joong (Plasma Surface Engineering Laboratory, School of Materials Science and Engineering, Seoul National University)
  • 발행 : 2007.08.31

초록

Transparent aluminum oxide films were deposited on polycarbonate (PC) substrates by inductively coupled plasma (ICP) assisted reactive sputtering. the oxygen flow rate was regulated by controlling the target voltage with a proportional integrate derivative controller. The PC substrate was treated with plasma prior to the deposition in order to the enhance the adhesive strength of the $Al_2O_3$ film. The characteristics of hardness, structure, density, transmittance, deposition rate, surface roughness and residual stress were investigated to estimate the possibility for the hard coating.

키워드

참고문헌

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