노광시스템을 위한 자동 정렬 비젼시스템

An Automatic Visual Alignment System for an Exposure System

  • 조태훈 (한국기술교육대학교 정보기술공학부) ;
  • 서재용 (한국기술교육대학교 정보기술공학부)
  • Cho, Tai-Hoon (School of Information Technology, Korea University of Technology and Education) ;
  • Seo, Jae-Yong (School of Information Technology, Korea University of Technology and Education)
  • 발행 : 2007.03.31

초록

For exposure systems, very accurate alignment between the mask and the substrate is indispensable. In this paper, an automatic alignment system using machine vision for exposure systems is described. Machine vision algorithms are described in detail including extraction of an alignment mark's center position and camera calibration. Methods for extracting parameters for alignment are also presented with some compensation techniques to reduce alignment time. Our alignment system was implemented with a vision system and motion control stages. The performance of the alignment system has been extensively tested with satisfactory results. The performance evaluation shows alignment accuracy of lum within total alignment time of about $2{\sim}3$ seconds including stage moving time.

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