An Automatic Visual Alignment System for an Exposure System

노광시스템을 위한 자동 정렬 비젼시스템

For exposure systems, very accurate alignment between the mask and the substrate is indispensable. In this paper, an automatic alignment system using machine vision for exposure systems is described. Machine vision algorithms are described in detail including extraction of an alignment mark's center position and camera calibration. Methods for extracting parameters for alignment are also presented with some compensation techniques to reduce alignment time. Our alignment system was implemented with a vision system and motion control stages. The performance of the alignment system has been extensively tested with satisfactory results. The performance evaluation shows alignment accuracy of lum within total alignment time of about $2{\sim}3$ seconds including stage moving time.