Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Comparison on Properties of ZnO Thin Films Grown by RF Magnetron Sputtering on Various Oxide Substrates

다양한 산화물 기판 위에 RF 마그네트론 스퍼터링 방법으로 성장된 ZnO 박막의 특성 비교

  • 이재욱 (한국과학기술원 신소재공학과) ;
  • 정철원 (충남대학교 재료공학과) ;
  • 한석규 (충남대학교 재료공학과) ;
  • 최준호 (충남대학교 재료공학과) ;
  • 홍순구 (충남대학교 재료공학과) ;
  • 조형균 (성균관대학교 신소재공학과) ;
  • 송정훈 (공주대학교 물리학과) ;
  • 이정용 (한국과학기술원 신소재공학과)
  • Published : 2007.04.01
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Abstract

ZnO thn films are grown on five kinds of oxide substrates including $c-Al_2O_3(0001),\;r-Al_2O_3(01-12)$, MgO(100), MgO(111), $NdGaO_3(110)$ by rf magnetron sputtering and effects substrate types on properties of ZnO thin films ate investigated. In order to compare the substrate effects one growth condition is selected and all the films are grown by the same growth condition. Structural and optical properties of the ZnO films ate different depending on the substrates although the films ate not epitaxial but polycrystalline. The ZnO film grown on $NdGaO_3(100)$ substrate shows the best overall properties among the films grown on substrates investigated in this study.

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References

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