Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Deposition of Al Doped ZnO Films Using ICP-assisted Sputtering on the Plastic Substrate

유도결합 플라즈마 스퍼터링을 이용한 플라스틱 기판 상의 Al이 도핑된 ZnO 박막 증착

  • Jung, Seung-Jae (School of Materials Science and Engineering, Seoul National University) ;
  • Han, Young-Hun (School of Materials Science and Engineering, Seoul National University) ;
  • Lee, Jung-Joong (School of Materials Science and Engineering, Seoul National University)
  • Published : 2006.06.30
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Abstract

Al-doped ZnO (AZO) films were deposited on the plastic substrate by inductively coupled plasma (ICP) assisted DC magnetron sputtering. The AZO films were produced by sputtering a metallic target (Zn/Al) in a mixture of argon and oxygen gases. AZO films with an electrical resistivity of ${\sim}10^3\;{\Omega}cm$ and an optical transmittance of 80% were obtained even at a low deposition temperature. In-situ process control methods were used to obtain stable deposition conditions in the transition region without any hysteresis effect. The target voltage was controlled either at a constant DC power. It was found that the ratio of the zinc to oxygen emission intensity, I (O 777)/I (Zn 481) decreased with increasing the target voltage in the transition region. The $Ar/O_2$ plasma treatment improve the adhesion strength between the polycarbonate substrate and AZO films.

Keywords

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