Transactions on Electrical and Electronic Materials

  • 제7권3호
  • /
  • Pages.108-111
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  • 2006
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  • 1229-7607(pISSN)
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  • 2092-7592(eISSN)
한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
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Application of Potential-pH Diagram and Potentiodynamic Polarization of Tungsten

  • Seo, Yong-Jin (Department of Electrical Engineering, Daebul University) ;
  • Park, Sung-Woo (Department of Electrical Engineering, Daebul University) ;
  • Lee, Woo-Sun (Department of Electrical Engineering, Chosun University)
  • 발행 : 2006.06.01
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초록

The oxidizer-induced corrosion state and microstructure of surface passive metal-oxide layer greatly influenced on the removal rate of tungsten film according to the slurry chemical composition of different mixed oxidizers. In this paper, the actual polishing mechanism and pH-potential equilibrium diagram obtained from potentiodynamic polarization curve were electrochemically compared. An electrochemical corrosion effect implies that slurries with the highest removal rate (RR) have the high dissolution rate.

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참고문헌

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피인용 문헌

  1. Slurry components in metal chemical mechanical planarization (CMP) process: A review vol.17, pp.12, 2016, https://doi.org/10.1007/s12541-016-0201-y
  2. High-performance aqueous asymmetric supercapacitor based on K 0.3 WO 3 nanorods and nitrogen-doped porous carbon vol.330, 2016, https://doi.org/10.1016/j.jpowsour.2016.09.022