한국산학기술학회논문지 (Journal of the Korea Academia-Industrial cooperation Society)
- 제7권3호
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- Pages.344-349
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- 2006
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- 1975-4701(pISSN)
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- 2288-4688(eISSN)
LPCVD 방법에 의한 저온 $SiO_2$ 박막의 증착방법과 DRAM 커패시터에서의 그 신뢰성 연구
Novel Low-Temperature Deposition of the $SiO_2$ Thin Film using the LPCVD Method and Evaluation of Its Reliability in the DRAM Capacitors
- 발행 : 2006.03.01
초록
[
The low-temperature processing is very important for fabrication of the very large scale (