Applied Chemistry for Engineering (공업화학)

The Korean Society of Industrial and Engineering Chemistry (한국공업화학회)
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Preparation and Properties of Soluble Polyimide with Methacryloyl Group

Methacryloyl기를 함유한 가용성 폴리이미드의 합성과 감광 특성

  • Yoon, Keun-byoung (Department of Polymer Science, Engineering College, Kyungpook National University) ;
  • Son, Hyung-jun (Chemicals & Polymers Business Unit, LG Chem, Ltd.) ;
  • Lee, Dong-ho (Department of Polymer Science, Engineering College, Kyungpook National University)
  • 윤근병 (경북대학교 공과대학 고분자공학과) ;
  • 손형준 ((주)LG화학 화성사업부) ;
  • 이동호 (경북대학교 공과대학 고분자공학과)
  • Received : 2006.02.10
  • Accepted : 2006.03.17
  • Published : 2006.04.10
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Abstract

Polyimides have been investigated extensively and used widely over the past three decades because of their high performance properties such as excellent thermal, mechanical, and electrical properties. Polyimides are difficult to be processed because of the aromatic moieties, imide group, and insoluble nature in most organic solvents. The soluble polyimides were synthesized from 2,2,-bis(3-amino-4-hydroxyphenyl) hexafluoropropane (BAPAF) and 3,3,-diamino-4,4-dihydroxybyphenyl (HAB) as aromatic diamines and 4,4-(hexafluoroisopropylidene)diphthalic dianhydride (6FDA), pyromellitic dianhydride (PMDA), 4,4-oxydiphthalic dianhydride (OPDA), 3,3,4,4-benzophenone tetracarboxylic dianhydride (BTDA) and 3,3,4,4-diphenylsulfone tetracarboxylic dianhydride (DSDA) as aromatic dianhydrides. The polyimides were characterized by NMR, FR-IR, TGA and the dielectric constant of the obtained polyimides was calculated from storage of electro-capacity. A novel photosensitive polyimide was synthesized by the reaction of polyimide, containing hydroxyl group and methacryloyl chloride using triethylamine. The good micro-pattern was obtained with photosensitive polyimide from the photolithographic technique.

폴리이미드는 높은 열안정성, 우수한 기계적, 전기적 성질을 가지고 있어 많은 연구가 진행되어 왔지만, 대부분의 유기용매에 불용인 관계로 그 용도가 제한되어 있다. 본 연구에서는 방향족 디아민인 2,2,-bis(3-amino-4-hydroxyphenyl) hexafluoropropane (BAPAF)와 3,3,-diamino-4,4- dihydroxybyphenyl (HAB)를 사용하고 방향족 디안하이드라이드인 4,4-(hexafluoroisopropylidene)diphthalic dianhydride (6FDA), pyromellitic dianhydride (PMDA), 4,4-oxydiphthalic dianhydride (OPDA), 3,3,4,4-benzophenone tetracarboxylic dianhydride (BTDA) 및 3,3,4,4-diphenylsulfone tetracarboxylic dianhydride (DSDA)를 사용하여 가용성 폴리이미드를 합성하였다. 폴리이미드의 성질은 NMR, FR-IR 및 TGA를 이용하여 조사하였으며, 유전상수는 축전용량을 측정하여 계산하였다. 히드록시기를 포함한 폴리이미드와 methacryloyl chloride를 반응시켜 감광성 폴리이미드를 합성하고, photolithography기술을 이용하여 micro-패턴을 형성하였다.

Keywords

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