Photo-Degradation Behavior of Silk Fabrics

견직물의 광열화 거동

  • Lee, Hack-Jung (Dept. of Textile Engineering, Pusan National University) ;
  • Kwon, Young-Suk (Korean Traditional Costume Research Institute, Pusan National University) ;
  • Jang, Jeong-Dae (Dept. of Clothing & Textiles, Pusan National University) ;
  • Lee, Sang-Joon (Dept. of Microbiology, Pusan National University) ;
  • Cho, Hyun-Hok (Dept. of Textile Engineering, Pusan National University)
  • 이학정 (부산대학교 섬유신소재공학과) ;
  • 권영숙 (부산대학교 한국전통복식연구소) ;
  • 장정대 (부산대학교 의류학과) ;
  • 이상준 (부산대학교 미생물학과) ;
  • 조현혹 (부산대학교 섬유신소재공학과)
  • Published : 2006.12.27

Abstract

Researches to preserve and restore the remaining fabrics as costume heritages have been carried out. In this study, in order to artificially restore an excavated silk fabrics, degummed silk fabrics and safflower dyed silk fabrics were prepared for an experiment. These fabrics were photo-degraded by the Xenon arc beam to have various strength retention(100%, 80%, 60%, 40%, 20%). The fine structure and physical properties of Xenon arc treated fabrics were investigated with various techniques such as tensile test, weight loss, wide-angle X-ray diffraction, yellowness, color, SEM etc. Tensile strength and the crystal diffraction intensity of silk fabrics decreased as Xenon arc hem treatment time increased. Weight loss increased slightly. Strength retention was decreased as the Xenon arc beam treatment time goes by. (Yellowness of the undyed silk fabrics and $L^*$ of the dyed silk fabrics increased. Whiteness of the undyed silk fabrics and $b^* of the dyed silk fabrics decreased.) SEM results of the silk fabrics treated Xenon arc beam show that surface was a little damaged.

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