Bulletin of the Korean Chemical Society

Korean Chemical Society (대한화학회)
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Molecular Emission of CF4 Gas in Low-pressure Inductively Coupled Plasma

  • Jung, T.Y. (Department of Chemistry, Dankook University) ;
  • Kim, D.H. (Department of Chemistry, Dankook University) ;
  • Lim, H.B. (Department of Chemistry, Dankook University)
  • Published : 2006.03.20
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Abstract

$CF_4$ gas is one of the most common chemicals used for dry etching in semiconductor manufacturing processes. For application to the etching process and environmental control, the low-pressure inductively coupled plasma (LP-ICP) was employed to obtain the spectrum of $CF_4$ gas. In terms of the analysis of the spectra, trace CF radical by A-X and B-X transitions was detected. The other $CF_x$ radicals, such as $CF_2$ and $CF_3$, were not seen in this experiment whereas strong C and $C_2$ emissions, dissociation products of $CF_4$ gas, were observed.

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