반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)
- 제4권4호
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- Pages.13-17
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- 2005
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- 1738-2270(pISSN)
실리콘 웨이퍼 세정을 위한 오존의 거동에 관한 연구
Solubility Behavior of Ozone for Silicon Wafer Cleaning
- Lee Gun-Ho (Research and Development Division, Siltron Co., Ltd.) ;
- Kim In-Jung (Research and Development Division, Siltron Co., Ltd.) ;
- Bae So-Ik (Research and Development Division, Siltron Co., Ltd.)
- 발행 : 2005.12.01
초록
The behavior of ozone in