Journal of the Optical Society of Korea

  • 제9권1호
  • /
  • Pages.16-21
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  • 2005
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  • 1226-4776(pISSN)
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  • 2093-6885(eISSN)
한국광학회 (Optical Society of Korea)
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Fabrication of Nano Dot and Line Arrays Using NSOM Lithography

  • Kwon Sangjin (Department of Mechatronics, Gwangju Institute of Science and Technology) ;
  • Kim Pilgyu (Department of Mechatronics, Gwangju Institute of Science and Technology) ;
  • Jeong Sungho (Department of Mechatronics, Gwangju Institute of Science and Technology) ;
  • Chang Wonseok (Nanoprocessing Group, Korea Institute of Machinery and Materials) ;
  • Chun Chaemin (Department of Materials Science and Engineering, Gwangju Institute of Science and Technology) ;
  • Kim Dong-Yu (Department of Materials Science and Engineering, Gwangju Institute of Science and Technology)
  • 투고 : 2005.01.27
  • 발행 : 2005.03.01
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초록

Using a cantilever type nanoprobe having a 100㎚m aperture at the apex of the pyramidal tip of a near-field scanning optical microscope (NSOM), nanopatterning of polymer films are conducted. Two different types of polymer, namely a positive photoresist (DPR-i5500) and an azopolymer (Poly disperse orange-3), spincoated on a silicon wafer are used as the substrate. A He-Cd laser with a wavelength of 442㎚ is employed as the illumination source. The optical near-field produced at the tip of the nanoprobe induces a photochemical reaction on the irradiated region, leading to the fabrication of nanostructures below the diffraction limit of the laser light. By controlling the process parameters properly, nanopatterns as small as 100㎚ are produced on both the photoresist and azopolymer samples. The shape and size variations of the nanopatterns are examined with respect to the key process parameters such as laser beam power, irradiation time or scanning speed of the probe, operation modes of the NSOM (DC and AC modes), etc. The characteristic features during the fabrication of ordered structures such as dot or line arrays using NSOM lithography are investigated. Not only the direct writing of nano array structures on the polymer films but also the fabrication of NSOM-written patterns on the silicon substrate were investigated by introducing a passivation layer over the silicon surface. Possible application of thereby developed NSOM lithography technology to the fabrication of data storage is discussed.

키워드

참고문헌

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피인용 문헌

  1. Plasmonic Nanolithography: A Review vol.6, pp.3, 2011, https://doi.org/10.1007/s11468-011-9237-0
  2. Calibration of exposure dose for nanoscale plasmonic lithography with microsized far-field spot patterns vol.26, pp.9, 2016, https://doi.org/10.1088/0960-1317/26/9/095001
  3. Near-field optical control of doughnut-shaped nanostructures vol.334, 2015, https://doi.org/10.1016/j.optcom.2014.08.027
  4. Contact-pressure reduction of pyramidal optical probe array on corrugated aluminium/silicon nitride membranes vol.27, pp.4, 2017, https://doi.org/10.1088/1361-6439/aa62b4
  5. Development and Evaluation of an Electron Beam Source for Microscopy and Its Applications vol.14, pp.2, 2010, https://doi.org/10.3807/JOSK.2010.14.2.127