Journal of the Korean Society for Precision Engineering (한국정밀공학회지)

Korean Society for Precision Engineering (한국정밀공학회)
권호 표지

A Study on the Polymer Lithography using Stereolithography

광조형법을 이용한 고분자 리소그래피에 관한 연구

  • Published : 2005.01.01
Download PDF
⟨ Previous Next ⟩

Abstract

Mask manufacturing is a high COC and COO process in developing of semiconductor devices because of mask production tool with high resolution. Direct writing has been thought to be the one of the patterning method to cope with development or small-lot production of the device. This study consists two categories. One is the additional process of the direct and maskless patterning generation using SLA for easy and convenient application and the other is a removal process using wet-etching process. In this study, cured status of epoxy pattern is most important parameter because of the beer-lambert law according to the diffusion of UV light. In order to improve the contact force between patterns and substrate, prime process was performed and to remove the semi-cured resin which makes a bad effects to the pattern, spin cleaning process using TPM was also performed. At a removal process, contact force between photo-curable resin as an etching mask and Si wafer is important parameter.

Keywords

References

  1. Jeong, H., Son, J., Im, Y., Cho, J., 'A Study on color properties of multi-color functional prototype development using SLA,' Proc. of kspe, pp. 824-828, June, 2000
  2. Harriot, R., 'Limits of lithography,' Proc. of the IEEE, Vol. 89, No.3, pp. 366-374, March, 2001 https://doi.org/10.1109/5.915379
  3. Pique, A., Chrisey, D., 'A novel laser transfer process for direct writing of electronic and sensor materials,' Applied Physics A69 - Material Science & Processing, pp. 279-284, 1999 https://doi.org/10.1007/s003390051400
  4. Pautler, J., Brunn, St., Komer, T., Kuhling, F., 'Continuous image writer with improved critical dimension performance for high-accuracy maskless optical patterning,' Microelectric Engineering, Vol. 57-58, pp. 31-40, 2001 https://doi.org/10.1016/S0167-9317(01)00427-0
  5. Hayashi, T., Miyoshi, T., Tanaka, Y., Takahashi, S., 'Direct 3D forming using TFT-LCD mask,' The 8th International Conference on Rapid Prototyping, pp. 172-177, 2000
  6. Farsari, M., Birch, P., 'A novel high-accuracy microstereolithography method employing an adaptive electro-optic mask,' Journal of Material Processing Technology, pp. 167-172. 2000 https://doi.org/10.1016/S0924-0136(00)00672-5
  7. Chung, S., Im, Y., Jeong, H., 'A study on micro-replication of real 3D-shape structures using elastomeric mold : from pure epoxy to composite based on epoxy,' Int. Journal of Machine Tools & Manuf, Vol. 44, pp. 147-154, 2004 https://doi.org/10.1016/j.ijmachtools.2003.10.017
  8. Jacobs, P., 'Rapid Prototyping & Manufacturing,' Society of Manufacturing Engineers, 1992