반도체 장비의 변형 진단을 위한 shearographic system의 이론적 고찰 및 위상오차해석

Theoretical analysis and Phase Error Analysis of the Shearographic System for the Deformation Evaluation of Semiconductor Equipment

We presented a new method to obtain four speckle interferograms with relative phase shift of $\pi$/2 by passive devices such as waveplate and polarizer, calculate the phase at each point of the speckle interferogram in shearography using Wollaston prism, which can be applied to the deformation evaluation of semiconductor devices, and theoretically demonstrated the feasibility of the proposed method by Jones matrix.