한국전기전자재료학회논문지 (Journal of the Korean Institute of Electrical and Electronic Material Engineers)

  • 제18권8호
  • /
  • Pages.739-746
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  • 2005
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  • 1226-7945(pISSN)
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  • 2288-3258(eISSN)
한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
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컴퓨터로 설계한 2 위상 흘로그램 광 저대역 필터에서 위상차가 필터의 MTF 특성에 미치는 영향

Effects of the Phase Error on the MTF Characteristics of Binary-phase Hologram Optical Low-pass Filter

  • 고춘수 (원광대학교 반도체 광디스플레이학부) ;
  • 오용호 (원광대학교 반도체 광디스플레이학부)
  • 발행 : 2005.08.01
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초록

When we design a binary phase holographic optical low-pass filter (HOLF), the phase difference is generally set to be $\pi$ to optimize the diffraction efficiency. However, the phase difference of real HOLF mostly deviate from $\pi$ by the error in the fabrication process. The deviation causes the (0,0)-th order diffracted beam to increase, which results In raising the diffraction efficiency. To study the effects of the phase error on the performance of HOLF, we calculated the MTF of HOLF for various phase differences. The results show that the phase error of 10 $\%$ makes little change in the filtering characteristics of HOLF. Considering the filtering by lens and CCD, the effects of the phase error becomes much smaller. To confirm it experimentally, we fabricated HOLFs for various phase differences. After installing it in a digital camera, we take picture of test targets and observe the Moire fringes and the resolution. The results agree with our prediction.

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참고문헌

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