한국재료학회지 (Korean Journal of Materials Research)

  • 제15권7호
  • /
  • Pages.486-490
  • /
  • 2005
  • /
  • 1225-0562(pISSN)
  • /
  • 2287-7258(eISSN)
한국재료학회 (Materials Research Society of Korea)
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NiO를 첨가한 WO3 박막의 미세 구조 거동

The behavior of WO3 Thin Film on NiO Addition

  • 김광호 (조선대학교 신소재공학과) ;
  • 나동명 (조선대학교 신소재공학과) ;
  • 최광표 (전남 신소재기술산업화 지원센터) ;
  • 박진성 (조선대학교 신소재공학과)
  • Kim Gwang-Ho (Department of Materials science and Engineering, Chosun University) ;
  • Na Dong-Myong (Department of Materials science and Engineering, Chosun University) ;
  • Choi Gwang-Pyo (JAMIC, Sunchun, Jeonnam) ;
  • Park Jin-Seong (Department of Materials science and Engineering, Chosun University)
  • 발행 : 2005.07.01
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초록

Thin films of tungsten oxide and nickel oxide were deposited on $Al_2O_3/Si-substrate$ by high vacuum thermal evaporation. The properties of microstructure and crystallinity were analyzed by SEM and XRD respectively. $WO_3$ films without addition of NiO showed polycrystalline structure after annealing at $500^{\circ}C$ for SO min. There were the cracks between the polycrystalline grains and the crack width was increased with the thickness of $WO_3$ films. The cracks in the $WO_3$ films could be controlled by an optimum deposition of NiO on $WO_3$ films and either less or more than the optimum addition fails to suppress the cracks. A process mechanism to suppress the crack has been discussed.

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참고문헌

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