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Effect of Island Size on the Packing Density in the Early Stages of Alkylsilane-Based Monolayer Self Assembly

  • Lee, Bo-H. (Department of Chemsitry, Kookmin University) ;
  • Sung, Myung-M. (Department of Chemsitry, Kookmin University)
  • Published : 2005.01.20

Abstract

The early stage of the self assembly for octadecyltrichlorosilane (OTS)-based monolayers is investigated using atomic force microscopy (AFM). Height measurements using AFM prove that the island height of the monolayers gradually increases with increasing the island size, and is close to the limiting value (h = $\sim$25 $\AA$) after d = $\sim$600 nm in size. Since the theoretical length of a covalently bound OTS molecule is 26.2 Å, the limiting value of the island height means that the islands with d ${\geq}$ 600 nm consist of close-packed, fully extended chains. The heights for the islands with d < 600 nm are lower than the limiting value and decrease with decreasing the island sizes. This observation indicates that the OTS molecules in the small islands are less densely packed, and that the packing densities of the islands increase as the islands grow in size.

Keywords

References

  1. Ulman, A. An Introduction to Ultrathin Organic Films; Academic Press: Boston, MA, 1991
  2. Swalen, J. D.; Allara, D. L.; Andrade, J. D.; Chandross, E. A.; Garoff, S.; Israelachvili, J.; McCarthy, T. J.; Murray, R.; Pease, R. F.; Rabolt, J. F.; Wynne, K. J.; Yu, H. Langmuir 1987, 3, 932 https://doi.org/10.1021/la00078a011
  3. Sung, M. M.; Yun, W. J.; Lee, S. S.; Kim, Y. Bull. Korean Chem. Soc. 2003, 24, 610 https://doi.org/10.5012/bkcs.2003.24.5.610
  4. Sung, M. M.; Kim, Y. Bull. Korean Chem. Soc. 2001, 22, 748
  5. Wasserman, S. R.; Tao, Y.-T.; Whitesides, G. M. Langmuir 1989, 5, 1074 https://doi.org/10.1021/la00088a035
  6. Silberzan, P.; Leger, L.; Ausserre, D.; Benattar, J. J. Langmuir 1991, 7, 1647 https://doi.org/10.1021/la00056a017
  7. Allara, D. L.; Parikh, A. N.; Rondelez, F. Langmuir 1995, 11, 2357 https://doi.org/10.1021/la00007a007
  8. Carraro, C.; Yauw, O. W.; Sung, M. M.; Maboudian, R. J. Phys. Chem. B 1998, 102, 4441 https://doi.org/10.1021/jp981019f
  9. Sung, M. M.; Carraro, C.; Yauw, O. W.; Kim, Y.; Maboudian, R. J. Phys. Chem. B 2000, 104, 1556 https://doi.org/10.1021/jp993288r
  10. Brozoska, J. B.; Shahidzadeh, N.; Rondelez, F. Nature 1992, 360, 719 https://doi.org/10.1038/360719a0
  11. Brozoska, J. B.; Ben Azouz, I.; Rondelez, F. Langmuir 1994, 10, 4367 https://doi.org/10.1021/la00023a072
  12. Parikh, A. N.; Allara, D. L.; Azouz, I. B.; Rondelez, F. J. Phys. Chem. 1994, 98, 7577 https://doi.org/10.1021/j100082a031
  13. Schwartz, D. K.; Steinberg, S.; Israelachvili, J; Zasadzinski, J. A. N. Phys. Rev. Lett. 1992, 69, 3354 https://doi.org/10.1103/PhysRevLett.69.3354
  14. Bierbaum, K.; Grunze, A. A.; Baski, A. A.; Chi, L. F.; Schrepp, W.; Fuchs, H. Langmuir 1995, 11, 2143 https://doi.org/10.1021/la00006a049
  15. Vallant, T.; Brunner, B.; Mayer, U.; Hoffmann, H.; Leitner, T.; Resch, R.; Friedbacher, G. J. Phys. Chem. B 1998, 102, 7190 https://doi.org/10.1021/jp981282g
  16. Britt, D. W.; Hlady, V. J. Colloid Interf. Sci. 1996, 178, 775 https://doi.org/10.1006/jcis.1996.0177
  17. Balgar, T.; Bautista, R.; Hartmann, N.; Hasselbrink, E. Surface Science 2003, 532-535, 963 https://doi.org/10.1016/S0039-6028(03)00101-8
  18. Rozlosnik, N.; Gerstenberg, M. C.; Larsen, N. B. Langmuir 2003, 19, 1182 https://doi.org/10.1021/la025906s
  19. Ishizaka, A.; Shiraki, Y. J. Electrochem. Soc. 1986, 133, 666 https://doi.org/10.1149/1.2108651
  20. Basnar, B.; Friedbacher, G.; Brunner, H.; Vallant, T.; Mayer, U.; Hoffmann, H. Applied Surface Science 2001, 171, 213 https://doi.org/10.1016/S0169-4332(00)00761-3

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