한국레이저가공학회지 (Laser Solutions)
- 제7권3호
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- Pages.37-46
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- 2004
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- 1229-0963(pISSN)
He-Cd 레이저와 근접장현미경을 이용한 폴리머박막 나노리소그라피 공정의 특성분석
Characteristics of nanolithograpy process on polymer thin-film using near-field scanning optical microscope with a He-Cd laser
- 권상진 (광주과학기술원 기전공학과) ;
- 김필규 (광주과학기술원 기전공학과) ;
- 천채민 (광주과학기술원 신소재공학과) ;
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김동유
(광주과학기술원 신소재공학과) ;
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장원석
(한국기계연구원 나노공정그룹) ;
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정성호
(광주과학기술원 기전공학과)
- Kwon S. J. (Dep. of Mechatronics, Gwangju Institute of Science & Technology) ;
- Kim P. K. (Dep. of Mechatronics, Gwangju Institute of Science & Technology) ;
- Chun C. M. (Dep. of Materials Science and Engineering, Gwangju Institute of Science & Technology) ;
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Kim D. Y.
(Dep. of Materials Science and Engineering, Gwangju Institute of Science & Technology) ;
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Chang W. S.
(Nanoprocessing Group, Korea Institute of Machinery & Materials) ;
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Jeong S. H.
(Dep. of Mechatronics, Gwangju Institute of Science & Technology)
- 발행 : 2004.12.01
초록
The shape and size variations of the nanopatterns produced on a polymer film using a near-field scanning optical microscope(NSOM) are investigated with respect to the process variables. A cantilever type nanoprobe having a 100nm aperture at the apex of the pyramidal tip is used with the NSOM and a He-Cd laser at a wavelength of 442nm as the illumination source. Patterning characteristics are examined for different laser beam power at the entrance side of the aperture(