References
- K Screenivas and Abhai Mansingh, J. Appl. Phys., 62(11), 4475 (1987) https://doi.org/10.1063/1.339037
- Hiroshi Nakasima, Sigeki Hazumi, Tadashi Kamiya, Kouji Tominaga and Masaru Okada, J. Appl. Phys., 33, 5139 (1994) https://doi.org/10.1143/JJAP.33.5139
- Yukio Fukuda, Katsuhiro Aoki, Ken Numata and Akitoshi Nishimura, J. Appl. Phys., 33, 5255 (1994) https://doi.org/10.1143/JJAP.33.5255
- A. F. Tasch and L. H. Parker, Proceeding of IEEE., 17 (1989)
- R.A. Roy, K.F. Etzold and J.J. Cnomo, MRS symp. Proc., 200, 141 (1990) https://doi.org/10.1557/PROC-200-141
- K. L. Siefering and G. L. Griffin, J.Electrochem. Soc., 137(3), 280 (1990) https://doi.org/10.1149/1.2086561
- M. Yokajawa, H. Iwasa and I. Termoto, Jpn. J. Appl. Phys, 7, 96 (1968) https://doi.org/10.1143/JJAP.7.96
- Yoshmasa Kumashiro, Yoshiki Kinoshita, Yoichi Takaoka and Sadao Murasawa, Jpn. J. Ceramic. Soc., 101(5), 514 (1993) https://doi.org/10.2109/jcersj.101.514
- M. Yokazawa, H. Iwasa and I. Tramoto, Jpn. J. Appl. Phys., 7, 96 (1968) https://doi.org/10.1143/JJAP.7.96
- T. Hirai, T. goto, H. Matsuhasi, S. Tanimoto, and Y, Tarui, Jpn. J. Appl. phys, 32, 4073 (1993)
- C. S. Chem, J. zhao, L. Luo, P.Lu, Y.Q.Li, O. Norris, F. Cosadey, C. J. Maggiore, B. Gallois, and. B. J. Wilken, Appl. Phys. Lett, 63, 1144 (1992) https://doi.org/10.1063/1.106433
- S. B. Krupanidhi, N. Maffei, Maffei, M. SAyer, and K.E.Assal, J. Appl. phys, 54, 660 (1993) https://doi.org/10.1063/1.332072
- J. A. Thornton, Depo. tech. Films and Coating. Noyer Publ., New. Jersy, 170 (1982)
- A.R Nyaiesh and L. Holland, J. Vac. Sci. Tech, 20(4), 1389 (1982) https://doi.org/10.1116/1.571613
- K. Reichort and X. Jing, Thin Soild Films, 191, 91 (1990) https://doi.org/10.1016/0040-6090(90)90277-K
- R. Mossier, A. P. Gili and R. A. Roy, J. Vac. Sci. Tech, 2, 500 (1984) https://doi.org/10.1116/1.572604
- G. Choi, J. Korean Institute. Met., 31(11), 1457 (1993)
- L. Jian Meng, and M. P. des Santos, Thin Solid Films, 226, 217 (1993) https://doi.org/10.1016/0040-6090(93)90200-9
- K. H. Ko, J. H. Ahn and U U Chi, J. Chem. Soc. Jpni, 103(3), 217 (1995)
- L. S. Hsu, R. Rujkkorakarn, J. R. Sites and C. Y. Shei, J. Appl. Phys, 59(10), 3457(1986) https://doi.org/10.1063/1.336814
- P.H. Lee, G. H. Ko, J. H. Ahn, S. I. Lee, Korean J. Mater. Res, 6(8), 852 (1996)
- H. K Pulker, G. Paesold and E. Ritter, Appl. Optics, 12, 2986 (1976) https://doi.org/10.1364/AO.15.002986
- C. Narashima Rao and S. Mlham, J. Vac. Sic. Tech, 4, 3260 (1990) https://doi.org/10.1116/1.576575
- Takeshi Kamada, Masatoushi Kitagawa, Munehiro Shibuya and Takashi, Jpn. J. Appl. Phys., 30(12B), 3594 (1991) https://doi.org/10.1143/JJAP.30.3594
- Charls JPouchert, The Aldrich Library of FT-IR Spectra Index, Aldrich Chemical Company Inc, 2(1985)