Nano/Micro-scale friction properties of Silicon and Silicon coated with Chemical Vapor Deposited (CVD) Self-assembled monolayers

  • Yoon, Eui-Sung (Tribology Research Center, Korea Institute of Science and Technology) ;
  • R.Arvind Singh (Tribology Research Center, Korea Institute of Science and Technology) ;
  • Oh, Hyun-Jin (Tribology Research Center, Korea Institute of Science and Technology) ;
  • Han, Hung-Gu (Tribology Research Center, Korea Institute of Science and Technology) ;
  • Kong, Ho-Sung (Tribology Research Center, Korea Institute of Science and Technology)
  • 발행 : 2004.12.01

초록

Abstract : Nano/micro-scale friction properties were investigated on Si (100) and three self-assembled monolayers (SAMs) (PFOTC, DMDM, DPDM) coated on Si-wafer by chemical vapor deposition technique. Experiments were conducted at ambient temperature(24$pm$1$circ$C) and humidity(45$pm$5%). Friction at nano-scale was measured using Atomic Force Microscopy (AFM) in the range of 0-40nN normal loads. In both Si-wafer and SAMs, friction increased linearly as a function of applied normal load. Results showed that friction was affected by the inherent adhesion in Ssi-wafer, and in the case of SAMs the physical/chemical structures had a major influence. Coefficient of friction of these test samples at the micro-scale was also energies. In order to study the effect of contact area on coefficient of friction at the micro-scale, friction was measured for Si-wafer and DPDM against Soda Lime balls (Duke Scientiffic Corporation) of different radii (0.25 mm, 0.5 mm and 1 mm) at different applied normal loads (1500, 3000 and 4800 mN). Results showed that Si-wafer had higher coefficient of friction than DPDM. Further, unlike that in the case of DPDM, friction in Si-wafer was severely influenced by its wear. SEM evidences showed that solid-solid adhesion was the wear mechanism in Si-wafer.

키워드

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