Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Repairing of a Defective Metallic Line using Laser CVD Deposited Tungsten Film in TFT LCD

레이저 CVD 텅스텐막 증착을 통한 TFT LCD 불량배선 수리

  • Published : 2004.10.01
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Abstract

The photodepositioned tungsten film by laser CVD has been carried out the taping test with scotch tape over 10 times. As a result, it exhibited strong adhesion to the under-film such as ITO and SiNx patterned on the LCD substrate. However, it was seriously attacked by alkaline solution used for removing polyimide. And a thickness of laser CVD tungsten film had a close relation to a speed of laser scanning. Also we have improved the success rate of a laser CVD repair with making two pairs of contact hole structure and decreasing laser scanning speed.

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References

  1. 이홍규, 이경철, '집속 아르곤 이온 레이저 빔을 이용한 레이저 유도 직접 구리 패터닝', 전기전자재료학회논문지, 13권, 11호, p. 969, 2000
  2. 류정탁, Kenjiro Oura, 김연보, '레이저 중착법에 의한 탄소계 박막의 구조 및 전계방출특성' 전기전자재료학회논문지, 15권, 7호, p. 634, 2002
  3. Y. Morishige, S. Kishida, and S. Kishida, 'High performance contact formation in LSI circuit restructuring using visible pulse laser induced ablation and CVD', Appl. Surface Science 46, p. 108, 1990 https://doi.org/10.1016/0169-4332(90)90128-M
  4. R. Tatsumi, 'Process technology for photomask repair', Electronic Parts and Materials (Tokyo) 17, p. 49, 1978
  5. M. M. Oprysko, M. W. Beranek, and P. L. Young, 'Visible-laser repair of clear defects In photomasks', IEEE Electron Device Letters, Vol. EDL-6, No. 7, p. 344, 1985
  6. Y. Yoshino, T. Miyagawa, S. Murakami, and Y. kusumi. 'Laser mask repair using laser CVD', IEEE Tokyo section, No. 26, 1987
  7. R. Solanki, P. K. Boyer, and G. J. Collins, 'Low-temperature refractory metal film deposition', Appl. Phys, Lett., 41(11), 1982