제어로봇시스템학회논문지 (Journal of Institute of Control, Robotics and Systems)

  • 제10권7호
  • /
  • Pages.604-610
  • /
  • 2004
  • /
  • 1976-5622(pISSN)
  • /
  • 2233-4335(eISSN)
제어로봇시스템학회 (Institute of Control, Robotics and Systems)
권호 표지
DOI QR코드

DOI QR Code

다중 디스펜싱 방법에 의한 UV-나노임프린트 리소그래피

UV nanoimprint lithography using a multi-dispensing method

  • 심영석 (한국기계연구원 나노메카니즘그룹) ;
  • 손현기 (한국기계연구원 레이저응용시스템그) ;
  • 신영재 (한국기계연구원 나노메카니즘그) ;
  • 이응숙 (한국기계연구원 지능형정밀기계연구) ;
  • 정준호 (한국기계연구원 나노메카니즘그룹)
  • 발행 : 2004.07.01
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. Since the resolution of transferred nanostructures depends strongly upon that of nanostamps, the nanostamp fabrication technology is a key technology to UV-NIL. In this paper, a $5\times5\times0.09$ in. quartz stamp whose critical dimension is 377 nm was fabricated using the etching process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. To effectively apply the fabricated 5-in. stamp to UV-NIL on a 4-in. Si wafer, we have proposed a new UV-NIL process using a multi-dispensing method as a way to supply resist on a wafer. Experiments have shown that the multi-dispensing method can enable UV-NIL using a large-area stamp.

키워드

참고문헌

  1. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, 'Nanoimprint lithography,' J. Vac. Sci. Technol. B vol. 14(6), pp. 4129-4133, 1996 https://doi.org/10.1116/1.588605
  2. J. Haisma, M. Verheijen, and K. Heuvel 'Mold-assisted nanolithography: A process for reliable pattern replication,' J. Vac. Sci. Technol. B, vol. 14(6), pp. 4124-4128, 1996 https://doi.org/10.1116/1.588604
  3. M. Colburn, S. Johnson, M. Stewart, S. Damlse, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S.V. Sreenivasan, J. Ekerdt, and C.G. Wilson, 'Step and flash imprint lithography: A new approach to high-resolution pattering,' Proc. SPIE, vol. 3676, pp. 379-389, 1999 https://doi.org/10.1117/12.351155
  4. S.V. Sreenivasan, 'Nanoimprint lithography using UV curable liquids,' in ASME international Conference on Integrated Nanosystems, Berkeley, CA, September 18-20. 2002
  5. M. Bender, M. Otto, B. Hadam, B. Spangenberg, and H. Kurz 'Multiple imprinting in UV-based nanoimprint lithography related material issues,' Microelectronics Eng., vol. 61-62, pp. 407-413, 2001 https://doi.org/10.1016/S0167-9317(02)00470-7
  6. J. Taniguchi, T. Kawasaki, Y. Tokano, Y. Kogo, I. Miyamoto, M. Komuro, H. Hiroshima, N. Sakai, and K. Tada, 'Measurement of adhesive force between mold and photocurable resin n imprint technology,' Jpn. J. Appl. Phys. vol. 41, pp. 4194-4197, 2002 https://doi.org/10.1143/JJAP.41.4194
  7. H. Hiroshima, S. Inoue, N. Kasahara, J. Taniguchi, I. Miyamotl, and M. Komuro, 'Uniformity in patterns imprinted using photo-curable liquid polymer,' Jpn. J. Appl. Phys. vol. 41, pp. 4173-4177, 2002 https://doi.org/10.1143/JJAP.41.4173
  8. T. C. Bailey, D. J. Resnick, D. Mancini, K. J. Nordquist, W. J. Dauksher, E. Ainley, A. Talin, K. Gehoski, J. H. Baker, B. J. Choi, S. Johnson, M. Colburn, M. Meissl, S. V. Sreenivasan, J. G. Ekerdt, and C. G. willson, 'Template fabrication schemes for step and flash imprint lithography,' Microelectronics Eng., vol. 61-62, pp. 461-467, 2002 https://doi.org/10.1016/S0167-9317(02)00462-8
  9. H. Otto, M. Bender, B. Hadam, F. Richter, B. Spangenberg, and H. Kurz, 'Step and reapeat UV-Nanoimprint Lithography: Material Issues,' in the First Conference on Nanoimprint and Nanoplrit Technology, San Francisco, CA, December 11-13, 2002