Journal of the Korean Ceramic Society (한국세라믹학회지)

The Korean Ceramic Society (한국세라믹학회)
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Fabrication and Microstructure of Hydroxyapatite Coating Layer by Plasma Spraying

플라즈마 용사법에 의한 Hydroxyapatite코팅층의 제조와 미세구조

  • 이치우 (공주대학교 신소재공학부) ;
  • 오익현 (공주대학교 신소재공학) ;
  • 이형근 (한밭대학교 재료공학) ;
  • 이병택 (공주대학교 신소재공학부)
  • Published : 2004.03.01
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Abstract

The microstructure of nano-sized hydroxyapatite (HAp) powders coating layer on ZrO$_2$ substrate was investigated, which was formed by plasma spray process. The nano-sized HAp powders were successfully synthesized by precipitation of Ca(NO$_3$)$_2$$.$4H$_2$O and (NH$_4$)$_2$HPO$_4$ solution. The HAp coating layer with thickness of 150∼250 $\mu\textrm{m}$ was free from the cracks at interfaces between the coating and ZrO$_2$ substrate. In the plasma sprayed HAp coating layer, the undesirable phases were not found, while in the HAp coating layer heat-treated at 800$^{\circ}C$, TTCP, and ${\beta}$-TCP phase were detected as well as HAp phase. However, at 900$^{\circ}C$, they were completely disappeared. At 1100$^{\circ}C$, XRD analysis revealed that the coating layer was composed of the highly crystallized HAp.

플라즈마 용사법에 의해 나노크기의 하이드록시 아파타이트 분말을 지르코니아 소결체 기판에 용사한 후 코팅층의 미세조직에 대해 조사하였다. 나노크기의 하이드록시 아파타이트 분말은 Ca(NO$_3$)$_2$$.$4$H_2O$과 (NH$_4$)$_2$HPO$_4$ 용액을 이용한 침전법에 의해 성공적으로 합성되었다. 코팅 후 지르코니아 기판과 코팅층 계면에서 균열은 발생하지 않았으며 코팅층의 두께는 150-250 $\mu\textrm{m}$였다. 나노크기의 하이드록시아파타이트 분말과 용사된 HAp코팅층에서는 비이상적인 상들의 출현이 발견되지 않았다. 80$0^{\circ}C$에서 열처리된 코팅층의 경우 하이드록시 아파타이트 이외에 TTCP와 $\beta$-TCP같은 상이 관찰되었지만 열처리온도 90$0^{\circ}C$에서 TTCP와 $\beta$-TCP상은 소멸되었다. XRD 분석결과, 열처리온도 110$0^{\circ}C$에서 HAp코팅층은 높은 결정화도를 나타내었다.

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