Wafer Motion Modeling of Transfer Unit in Clean Tube System

클린 튜브 시스템 이송 유닛의 웨이퍼 운동 역학 모델링

  • 신동헌 (서울시립대학교 기계정보공학과) ;
  • 정규식 (서울시립대학교 기계정보공학과) ;
  • 윤정용 (서울시립대학교 기계정보공학과)
  • Published : 2004.03.01

Abstract

This paper presents wafer motion modeling of transfer unit in clean tube system, which was developed as a means for transferring the air-floated wafers inside the closed tube filled with the super clean airs. When the wafer is transferred in x direction with an initial velocity the motion along x direction can be modeled as a simple decaying motion due to viscous friction of the fluid. But, the motion in y direction is modeled as a mass-spring-damper system where the recovering force by air jets issued from the perforated is modeled as a linear spring. Experiments with a clean tube system built fur 12 wafer show the validity of the presented force and motion models.

Keywords

References

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