대한기계학회논문집A (Transactions of the Korean Society of Mechanical Engineers A)

  • 제27권9호
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  • Pages.1517-1523
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  • 2003
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  • 1226-4873(pISSN)
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  • 2288-5226(eISSN)
대한기계학회 (The Korean Society of Mechanical Engineers)
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수정된 DXRL 공정에 의한 미세구조 제작

Fabrication of a Micro-Structure by Modified DXRL Process

  • 한상필 (한국전자통신연구원 광접속모듈팀) ;
  • 정명영 (한국전자통신연구원 광접속모듈팀) ;
  • 정석원 (전자부품연구원 나노메카트로닉스연구센터) ;
  • 김진태 (한국전자통신연구원 광접속모듈팀)
  • 발행 : 2003.09.01
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초록

Deep X-ray lithography (DXRL), a fabrication method for the production of microstructures with a high aspect ratio, plays an important role in the subsequent electroplanting process. However, secondary radiation is generated during X-ray exposure and damages the resist adhesion to the metal layer. To solve adhesion problems, we modified the conventional DXRL process, changing the sequence of polymer adhesion in DXRL process. With optimized X-ray exposure and development conditions based on a calculated and modified X-ray power spectrum, we fabricated various polymer microstructures and achieved a maximum aspect ratio of 40.

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참고문헌

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