Corrosion Science and Technology

The Corrosion Science Society of Korea (한국부식방식학회)
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A Study on the Plasma Etching of Ru Electrodes using $O_2/Cl_2$ Helicon Discharges

  • Published : 2003.08.01
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Abstract

The Ru etching using $O_2/C_{12}$ plasmas has been studied by employing the helicon etcher. The changes of Ru etch rate, Ru to $SiO_2$ etch selectivity and Ru electrode etching slope with varied process variables were investigated. The Ru etching slope at the optimized etching condition was measured to be $84^{\circ}$. We reveal that the Ru etching using $O_2/C_{12}$ plasma generates the $RuO_2$ thin film. Possible mechanism of Ru etching is discussed.

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References

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