The Effect of Etching on Low-stress Mechanical Properties of Polypropylene Fabrics under Helium/Oxygen Atmospheric Pressure Plasma

  • Hwang, Yoon J. (Department of Textile Engineering, Chemistry and Science, College of Textiles, North Carolina State University) ;
  • An, Jae Sang (Apparel & Sweater Technical Service Center, Korea Institute of Industrial Technology) ;
  • McCord, Marian G. (Department of Textile Engineering, Chemistry and Science, College of Textiles, North Carolina State University) ;
  • Park, Shin Woong (Department of Textile Engineering, Inha University) ;
  • Kang, Bok Choon (Department of Textile Engineering, Inha University)
  • 발행 : 2003.12.01

초록

Polypropylene nonwoven fabrics were exposed to He/$O_2$ atmospheric pressure glow discharge plasma. Surface chemical analysis and contact angle measurement revealed the surface oxidation by formation of new functional groups after plasma treatment. Weight loss (%) measurement and scanning electron microscopy analysis showed a significant plasma etching effect. It was investigated in low-stress mechanical properties of the fabrics using Kawabata Evaluation System (KES-FB). The surface morphology change by plasma treatment increased surface friction due to an enhancement of fiber-to-fiber friction, resulting in change of other low-stress mechanical properties of fabric.

키워드

참고문헌

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