Transactions on Electrical and Electronic Materials

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Black Silicon Layer Formation using Radio-Frequency Multi-Hollow Cathode Plasma System and Its Application in Solar Cell

  • U. Gangopadhyay (School of Electrical and Computer Engineering, Sung Kyun Kwan University) ;
  • Kim, Kyung-Hae (School of Electrical and Computer Engineering, Sung Kyun Kwan University) ;
  • S.K. Dhungel (School of Electrical and Computer Engineering, Sung Kyun Kwan University) ;
  • D. Mangalaraj (School of Electrical and Computer Engineering, Sung Kyun Kwan University) ;
  • Park, J.H. (School of Electrical and Computer Engineering, Sung Kyun Kwan University) ;
  • J. Yi (School of Electrical and Computer Engineering, Sung Kyun Kwan University)
  • Published : 2003.10.01
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Abstract

A low-cost, large area, random, maskless texturing scheme independent of crystal orientation is expected to have significant impact on terrestrial photovoltaic technology. We investigated silicon surface microstructures formed by reactive ion etching (R IE) in Multi-Hollow cathode system. Desirable texturing effect has been achieved when radio-frequency (rf) power of about 20 Watt per one hollow cathode glow is applied for our RF Multi -Hollow cathode system. The black silicon etched surface shows almost zero reflectance in the visible region as well as in near IR region. The etched silicon surface is covered by columnar microstructures with diameters from 50 to 100 nm and depth of about 500 nm. We have successfully achieved 11.7 % efficiency of mono-crystalline silicon solar cell and 10.2 % for multi-crystalline silicon solar cell.

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References

  1. P. Campbell and M, A. Green, 'Light trapping properties of pyramidally textured surfaces', J. Appl. Phys., Vol. 62, p. 243, 1987 https://doi.org/10.1063/1.339189
  2. S. Narayanan, 'High efficiency polycrystalline silicon solar cells', Ph. D. dissertation, University of New South Wales, Sydney, Australia, 1989
  3. P. Path, G. Wileke, E. Bucher, J. Szlufcic, R.M. Murti, K. De Clercq, J. Nijs, and R. Mertens, 'Mechanical wafer engineering for high efficiency solar cells: An investigation of the induced surface damage', Proc. $24^{th}$ IEEE Photovoltaic specialist conf., P. 1347, 1994
  4. M. Lipi$\~{n}$ski, P. Panek, Z. $\breve{S}$wiatek, E. Beltowska, and R. Ciach,'Double porous silicon layer on multi-crystalline Si for photovoltaic application', Solar Energy Matehals and Solar Cells, Vol. 72 , No. 1-4, p. 271, 2002 https://doi.org/10.1016/S0927-0248(01)00174-X
  5. R. Guerrero-Lemus, C. Hern$\'{a}$ndez-Rodriguez, F. Ben-Hander, and J. M.Martinez-Duart, 'Anodic and optical characterization of stain-etched porous silicon antireflection coatings', Solar Energy Materials and Solar cells, Vo1.72, No. 1-4, p. 495, 2002 https://doi.org/10.1016/S0927-0248(01)00197-0
  6. M. Saadoun, H. Ezzaouia, B. Bessa$\ddot l$s, M. F. Boujmil, and R. Bennaceur, 'Formation of porous silicon for large-area silicon solar cells: A new method', Solar Energy Materials and Solar cells , Vol. 59, No. 4, p. 377,1999 https://doi.org/10.1016/S0927-0248(99)00057-4
  7. D. Majumdar, S. Chatterjee, M. Dhar, S. K. Dutta, and H. Saha , 'Light trapping in layer transferred quasi monocrystalline porous silicon solar cell', Solar Energy Materials and Solar Cells, Vol. 77, No. 1, P. 51, 2003 https://doi.org/10.1016/S0927-0248(02)00254-4
  8. J. Zhao, A. Wang, and M.A. Green, '19.8% efficient 'honeycomb' textured multicrystalline and 24.4% monocrystalline silicon solar cells', Appl. Phys. Lett, Vol. 73, p. 1991, 1998 https://doi.org/10.1063/1.122345
  9. S. Winderbaum, O. Reinhold, and F. Yun, 'Reactive ion etching (RIE) as a method for texturing polycrystalline silicon solar cells', Solar Energy Materials and Solar Cells, Vol. 46, No. 3, p. 239, 1997 https://doi.org/10.1016/S0927-0248(97)00011-1
  10. Henri Jansen, Meint de Boer, Johannes Burger, Rob Legtenberg, and Miko Elwenspoek, 'The black silicon method II: the effect of mask material and loading on the reactive ion etching of deep silicon trenches', Microelectronic Engineering, Vol. 27, No. 1-4, p. 475, 1995 https://doi.org/10.1016/0167-9317(94)00149-O
  11. D. S. Ruby, W. K. Schubert, J. M. Gee, and S.H. Zaidi, 'Silicon cells made by self aligned selective emitter plasma etchback process', U. S. patent, 6091021, 2000
  12. D. S. Ruby and S. H. Zaidi, 'Metal catalyst technique for textuhng silicon solar cells', U. S. patent, 6329296, 2001