Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Characterization of Nanocomposite Ti-Si-N Films Prepared by a Hybrid Deposition System of A If and Sputtering Techniques

하이브리드 증착 시스템을 이용한 나노복합체 Ti-Si-N 박막의 특성 연구

  • 윤순영 (부산대학교 공과대학 재료공학부) ;
  • 최성룡 (부산대학교 공과대학 재료공학부) ;
  • 이미혜 (기술신용보증기금 기술평가센터) ;
  • 김광호 (부산대학교 공과대학 재료공학부)
  • Published : 2003.04.01
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Abstract

Ti - Si - N hard films were deposited on SKD11 steel substrates by a hybrid deposition system, where TiN was deposited by AIP method while Si was incorporated by sputtering one. The microstructure of Ti-Si-N films was revealed to be a composite of TiN crystallites and amorphous Si3N4 by instrumental analyses. The highest hardness value of about 45 Gpa was obtained at the Si content of around 7.7 at.%. With increase of Si content, the size of TiN crystallites was reduced and their distribution was changed from aligned to randomly orientated states. Surface roughness of Ti-Si-N film also decreased with increase of Si content.

Keywords

References

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