Macromolecular Research

The Polymer Society of Korea (한국고분자학회)
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Low Dielectric Constant of MeV ion-Implanted Poly(vinylidene fluoride)

  • Lee, Sang-Yun (Department of Physics and Center for Electro and Photo Responsive Molecules, Korea University) ;
  • Kim, Bo-Hyun (Department of Physics and Center for Electro and Photo Responsive Molecules, Korea University) ;
  • Park, Soung-Kyu (Department of Physics and Center for Electro and Photo Responsive Molecules, Korea University) ;
  • Jinsoo Joo (Department of Physics and Center for Electro and Photo Responsive Molecules, Korea University) ;
  • Beag, Yowng-Whoan (Thin Film Technology, Research Center, Korea Institute of Science and Technology) ;
  • Koh, Seok-keun (Thin Film Technology, Research Center, Korea Institute of Science and Technology)
  • Published : 2003.02.01
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Abstract

Poly (vinylidene fluoride) (PVDF) samples were implanted by using high energy (MeV)F$^{2+}$ and Cl$^{2+}$ ions. We observed that AC dielectric constant of the ion-implanted PVDF samples decreased from 10.5 to 2.5 at 1 kHz as the ion dosage increased from 10$^{11}$ to 3 $\times$ 10$^{14}$ ions/$\textrm{cm}^2$. From differential scanning calorimetry experiments, we observed that PVDF samples become more disordered state through the ion implantation. The decrease of the number of bonding of C-H and C-F and the increase of unsaturated bonding were observed from X-ray photoelectron spectroscopy experiments. The emission of HF and H$_2$ molecules during the ion implantation was detected by residual gas analyzer spectrum. Based upon the results, we analyzed that the low AC dielectric constant of the MeV ion-implanted PVDF samples originated from the reduction of polarization due to the structural change of the CF$_2$ molecules in the MeV ion-implanted PVDF samples.les.

Keywords

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