DOI QR코드

DOI QR Code

Charaterization of (Bi,La)Ti3O12 Ferroelectric Thin Films on Pt/Ti/SiO2/Si Substrates by sol-gel Method

졸-겔법으로 Pt/Ti/SiO2/Si 기판위에 제작된 (Bi,La)Ti3O12 강유전체 박막의 특성 연구

  • 황선환 (단국대학교 전자 컴퓨터공학부) ;
  • 장호정 (단국대학교 전자 컴퓨터공학부)
  • Published : 2002.11.01

Abstract

Metal-Ferroelectric-Metal(MFM) capacitors were prepared using $Bi_{3.3}$ $La_{0.7}$ $Ti_3$$O_{12}$ (BLT) ferroelectric thin films which were spin coated on $Pt/Ti/SiO_2$/Si substrates by the Sol-Gel method. BLT thin films annealed at above $650^{\circ}C$ showed polycrystalline structures with typical c-axis preferred orientation. The grain size and surface roughness were increased as the annealing temperature increased from $650^{\circ}C$ to $700^{\circ}C$. In addition, the full width at half maximum (FWHM) values were decreased with increasing annealing temperatures, indicating the improvement of crystallinity. The remanent polarization (2Pr= $Pr^{+}$ $+Pr^{-) }$ and leakage current of the BLT film annealed at $650^{\circ}C$ were about 29.3 $\mu$C/cm$^2$ and $2.3$\times$10^{-8}$$ A/cm^2$ at 3V. There were no distinct changes in the retention charges after $10^{10}$ polarization switching cycles, showing good fatigue property of the annealed BLT films.

Keywords

References

  1. B.A. Tuttle, Mater. Res. Bull. 12, 40 (1987) https://doi.org/10.1557/S088376940006721X
  2. J.F. Scott and C.A. Paz-de Araujo, Science, 246, 1400 (1989) https://doi.org/10.1126/science.246.4936.1400
  3. Auciello.O. & Ramesh. R. MRS Bull. 21, 31 (1996) https://doi.org/10.1557/S0883769400035314
  4. B.M. Melnick, J. Gregory, & C.A. paz-de Araujo, Inter. Ferroelectric 11, 145 (1995) https://doi.org/10.1080/10584589508013587
  5. T. Nakamura, Y. Nakao, A. Kamisawa, and H. Takasu, Ferroelectrics 11, 161 (1995) https://doi.org/10.1080/10584589508013588
  6. B.H. Park, B.S. Kang, S.D. Bu, T.W. Noh, J. Lee and W. Jo, Nature, 401, 682 (1999) https://doi.org/10.1038/44352
  7. T. Nakamura, Y. Nakao, A. Kamisawa and H. Takasu, Jpn. J. Appl. Phys., 33, 5207 (1994) https://doi.org/10.1143/JJAP.33.5207
  8. T. Choi, Y. Kim and J. Lee, J. Korean Phys. Soc. 40, 188 (2002)
  9. C.A. Paz de Araujo, J.D. Cuchiaro, L.D. McMillan and M.C. Scott, Nature, 374, 627 (1995) https://doi.org/10.1038/374627a0
  10. Peir Y. Chu, Robert E. Jones, Jr. Peter Zurcher, Deborah J. Taylor, Bo Jiang, and Sherry J. Cillespie, J. Mater. Res. 11, 1065 (1996) https://doi.org/10.1557/JMR.1996.0133
  11. M. Aoki, M. Mushiga, A. Itoh, T. Eshita, and Y. Arimoto, 1999 Sympo. VLSI Technol. Digest of Tech. Papers (Kyoto, june), 145, (1999)
  12. M. Takashi, Y. Hiroyuki, W. Hitoshi and Carlos A.Paz de Araujo, Jpn. J. Appl. Phys. 34, 5233 (1998) https://doi.org/10.1143/JJAP.34.5233
  13. K. Okamoto and E. Tokumitsu, Appl. Phys. Lett. 76, 2609 (2000) https://doi.org/10.1063/1.126424
  14. S.H. Hwang and H.J. Chang, J. Korean Phys. Soc. 41, 139 (2002)