Journal of Korean Vacuum Science & Technology

The Korean Vacuum Society (한국진공학회)
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Plasma-immersion ion Deposition of Hydrogenated Diamond-like Carbon Films on Dielectric Substrates

  • Kon (Inst. of High Electronics, Siberian Div. of RAS) ;
  • Chun, Hui-Gon (School of Materials Science and Engineering, ReMM, University of Ulsan) ;
  • Cho, Tong-Yul (School of Materials Science and Engineering, ReMM, University of Ulsan) ;
  • Nikolay S. Sochugov (Inst. of High Electronics, Siberian Div. of RAS) ;
  • You, Yong-Zoo (School of Materials Science and Engineering, ReMM, University of Ulsan)
  • Published : 2002.12.01
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Abstract

Method of plasma-immersion ion deposition of hydrogenated DLC films on relatively thick flat dielectric substrates from plasma of not-self-sustained low-pressure gas arc discharge is suggested. Coating properties have been investigated experimentally, average energy Per a deposited carbon atom depending on discharge current has been calculated. Optimum deposition parameters lot obtaining sufficiently hard and transparent high-adhesive a-C:H films on a 4-mm thick glass substrates have been determined. Possibility to use these coatings for photo-tools protection from abrasion wear at low operating loads is shown in general.

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