Journal of the Optical Society of Korea

  • 제6권4호
  • /
  • Pages.180-184
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  • 2002
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  • 1226-4776(pISSN)
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  • 2093-6885(eISSN)
한국광학회 (Optical Society of Korea)
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Gate CD Control for memory Chip using Total Process Proximity Based Correction Method

  • Nam, Byung--Ho (Memory R&D Division, Hynix Semiconductor Inc.) ;
  • Lee, Hyung-J. (Electronics Engineering Dept. Andong National University)
  • 투고 : 2002.09.10
  • 발행 : 2002.12.01
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초록

In this study, we investigated mask errors, photo errors with attenuated phase shift mask and off-axis illumination, and etch errors in dry etch conditions. We propose that total process proximity correction (TPPC), a concept merging every process step error correction, is essential in a lithography process when minimum critical dimension (CD) is smaller than the wavelength of radiation. A correction rule table was experimentally obtained applying TPPC concept. Process capability of controlling gate CD in DRAM fabrication should be improved by this method.

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참고문헌

  1. M. D. Levenson, et al., ED-29, 12 1928 (1982).
  2. K. Hashimoto, S. Usui, S. Hasebe, M. Murota, T. Nakayama, F. Matsuoka, S. Inoue, S. Kobayashi, and K. Yamamoto, Proc. of SPIE Optical Microlithography XI 3334, 224 (1998). https://doi.org/10.1117/12.310752
  3. W. Maurer, C. Dolainsky, J. Thiele, C. Friedrich, and P. Karakatsanis, Proc. of SPIE Optical Microlithography XI, 3334, 245 (1998). https://doi.org/10.1117/12.310754
  4. A. Misaka, A. Goda, S. Odanaka, S. Kobayashi, and H. Watanabe, VLSI Symposium '98, 170 (1998). https://doi.org/10.1109/VLSIT.1998.689244
  5. E. Kawamura, T. Haruki, Y. Manabe, and I. Hanyu, Jpn. J. Appl. Phys. 34, 6547 (1995). https://doi.org/10.1143/JJAP.34.6547
  6. B. H. Nam, J. O. Park, D. J. Lee, J. H. Cheong, Y. J. Hwang, and Y. J. Song, Proceedings of SPIE, Photomask and Next-Generation Lithography Mask Technology VII, 4066, 716 (2000). https://doi.org/10.1117/12.392101

피인용 문헌

  1. In-line Critical Dimension Measurement System Development of LCD Pattern Proposed by Newly Developed Edge Detection Algorithm vol.17, pp.5, 2013, https://doi.org/10.3807/JOSK.2013.17.5.392