Journal of the Korean Society for Precision Engineering (한국정밀공학회지)

Korean Society for Precision Engineering (한국정밀공학회)
권호 표지

Fabrication ofMicro/Nano-patterns using MC-SPL (Mechano-Chemical Scanning Probe Lithography) Process

미세탐침기반 기계-화학적 리소그래피공정에 의한 마이크로/나노패턴 제작

  • 성인하 (연세대학교 대학원 기계공학과) ;
  • 김대은 (연세대학교 기계공학부)
  • Published : 2002.11.01
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Abstract

In this work, a new non-photolithographic micro-fabrication technique is presented. The motivation of this work is to overcome the demerits of the most commonly used photolithographic techniques. The micro-fabrication technique presented in this work is a two-step process which consists of mechanical scribing followed by chemical etching. This method has many advantages over other micro-fabrication techniques since it is simple, cost-effective, rapid, and flexible. Also, the technique can be used to obtain a metal structure which has sub-micrometer width patterns. In this paper, the concept of this method and its application to microsystem technology are described.

Keywords

References

  1. Romankiw, L. T., 'A Path: From Electroplating through Lithographic Masks in Electronics to LIGA in MEMS', Electrochim. Acta, Vol.42, pp.2985-3005,1997 https://doi.org/10.1016/S0013-4686(97)00146-1
  2. Menz, W., 'LIGA and Related Technologies for Industrial Application', Sensor. Actuat. A-Phys., Vol.54, pp.785-789,1996 https://doi.org/10.1016/S0924-4247(97)80056-8
  3. Qin, D., Xia, Y., Rogers, J. A., Jackman, R. J., Zhao, X. M., Whitesides, G. M., 'Micro-fabrication, Microstructures and Microsystems', Top. Curr. Chem., Vol.194, pp.1-20,1998
  4. Rogner, A., Eicher, J., Munchmeyer, D., Peters, R. P., Mohr, J., 'The LIGA Technique-What are the new opportunities', J. Micromech. Microeng., Vol.2, pp.133-140,1992 https://doi.org/10.1088/0960-1317/2/3/004
  5. McKeown, P. A., 'The Role of Precision Engineering in Manufacturing of the Future', Ann. CIRP, Vol.36, pp.495-501,1987
  6. Taniguchi, N., Nanotechnology, Oxford University Press, New York, 1996
  7. Xia, Y., Whitesides, G. M., 'Soft Lithography', Angew. Chem. Int. Ed., Vol.37, pp.550-575,1998 https://doi.org/10.1002/(SICI)1521-3773(19980316)37:5<550::AID-ANIE550>3.0.CO;2-G
  8. H. Schift, R. W. Jaszewski, C. David and J. Gobrecht, 'Nanostructuring of polymers and fabrication of interdigitated electrodes by Hot Embossing Lithography', Microelectron. Eng., Vol.46, pp.121-124,1999 https://doi.org/10.1016/S0167-9317(99)00030-1
  9. Gottschalch, F., Hoffmann, T., Torres, C. M. S., Schulz, H., and Scheer, H. C., 'Polymer issues in nanoimprinting technique', Solid State Electron., Vol.43, pp.1079-1083,1999 https://doi.org/10.1016/S0038-1101(99)00028-3
  10. Snow, E. S., Campbell, P. M., 'Fabrication of Si nanostructures with an atomic force microscope', Appl. Phys. Lett., Vol.64, pp.1932-1934,1994 https://doi.org/10.1063/1.111746
  11. Minne, S. C., Adams, J. D., Yaralioglu, G., Manalis, S. R., Atalar, A., Quate, C. F., 'Centimeter scale atomic force microscope imaging and lithography', Appl. Phys. Lett., Vol.73, pp.1742-1744, 1998 https://doi.org/10.1063/1.122263
  12. Marrian, C. R. K., Perkins, F. K., Brandow, S. L., Koloski, T. S., Dobisz, E. A., Calvert, J. M., 'Low voltage electron beam lithography in self-assembled ultrathin films with the scanning tunneling microscope', Appl. Phys. Lett., Vol.64, pp.390-392,1994 https://doi.org/10.1063/1.111157
  13. Ivanisevic, A., Mirkin, C. A., 'Dip-Pen Nanolithography on Semiconductor Surfaces', J. Am. Chem. Soc., Vol.123, pp.7887-7889,2001 https://doi.org/10.1021/ja010671c
  14. Lee, J. M., Jin, W. H., Kim, D. E., 'Application of Single Asperity Abrasion Process for Surface Micromachining', Wear, Vol.251, pp.1133-1143, 2001 https://doi.org/10.1016/S0043-1648(01)00756-6
  15. Lee, J. M., Sung, I. H., Kim, D. E., 'Process Development of Precision Surface Micro-machining using Mechanical Abrasion and Chemical Etching', Microsyst. Technol., In press, 2002 https://doi.org/10.1007/s00542-002-0193-7
  16. Kim, D. E., Yi, J. J., 'Micro-patterning of Silicon by Frictional Interaction and Chemical Reaction', J. Tribol.-T. ASME, Vol. 120, No.2, pp.353-357,1998
  17. 진원혁, 김대은, '마스크에 대한 기계적 가공을 이용한 단결정 실리콘의 미세 패턴 가공,' 한국정밀공학회지, 제16권, 제2호, pp.60-67, 1999
  18. 이재준, 김대은, '기계 및 화학적 가공법을 이용한 신 미세가공기술,' 대한기계학회논문집(A), 제20권, 제10호, pp.3113-3125, 1996
  19. Xia, Y., Zhao, X.-M., Whitesides, G. M., 'Pattern transfer : Self-assembled monolayers as ultrathin resists', Microelectron. Eng., Vol.32, pp.255-268,1996 https://doi.org/10.1016/0167-9317(95)00174-3
  20. Cha, K. H., Kim, D. E., 'Investigation of the tribological behavior of octadecyltrichlorosilane deposited on silicon', Wear, Vol.251, pp. 1169-1176, 2001 https://doi.org/10.1016/S0043-1648(01)00729-3
  21. Biebuyck, H. A., Larsen, N. B., Delamarche, E., Michel, B., 'Lithography beyond light: Microcontact printing with monolayer resists', IBM J. Res. Develop., Vol. 41, No.1-2, pp.159-170,1997 https://doi.org/10.1147/rd.411.0159