Journal of Korean Vacuum Science & Technology
- Volume 6 Issue 1
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- Pages.5-7
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- 2002
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- 1226-6167(pISSN)
Nitrogen Depth Profiles in Ultrathin Oxynitride Films
- Shon, H.K. (Department of Physics, Chungbuk National University) ;
- Kang, H.J. (Department of Physics, Chungbuk National University) ;
- Chang, H.S. (Nano Surface Group, Korea Research Institute of standard and science) ;
- Kim, H.K. (Nano Surface Group, Korea Research Institute of standard and science) ;
- Moon, D.W. (Nano Surface Group, Korea Research Institute of standard and science)
- Published : 2002.06.01
Abstract
For quantitative N depth profiling, N profiles were measured in a~3 m Si oxynitride by low energy O
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